A novel infrared absorbing structure for uncooled infrared detector

Authors
Ahn, MisookHan, Yong-HeeMoon, Sung
Issue Date
2007-09
Publisher
ELSEVIER SCIENCE BV
Citation
CURRENT APPLIED PHYSICS, v.7, no.6, pp.617 - 621
Abstract
In this paper, we proposed a novel infrared absorbing structure for uncooled infrared detectors. The infrared absorber makes use of a quarter-wavelength structure composed of a dielectric layer, a protecting layer, an active layer, a supporting layer and a reflecting layer. Sputtered amorphous silicon is used as a dielectric layer because of its high refractive index. We fabricated the uncooled microbolometer with the proposed infrared absorbing structure by surface micromachining method. Then we characterized various bolometric properties such as thermal conductance, thermal time constant, responsivity and infrared absorptance. The fabricated bolometer showed the thermal conductance of 6.72 x 10(-7) W/K, the thermal mass of 4.43 x 10(-9) J/K, the thermal time constant of 6.6 ms and the responsivity of 7.76 x 10(3) V/W at 10 Hz chopper frequency and 9.22 mu A bias current. From the results, the estimated absorptance is about 80%. We expect that the proposed absorbing structure shows high infrared absorption and high performance of uncooled microbolometer. (C) 2007 Elsevier B.V. All rights reserved.
Keywords
MICROBOLOMETER; MICROBOLOMETER; microbolometer; infrared detector; infrared absorption; amorphous silicon
ISSN
1567-1739
URI
https://pubs.kist.re.kr/handle/201004/134144
DOI
10.1016/j.cap.2006.12.006
Appears in Collections:
KIST Article > 2007
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