접합유리와 반응된 Fe-Hf-N/Cr/SiO2 박막의 연자기 특성 열화

Abstract

The degradation mechanism of soft magnetic properties of Fe-Hf-N/Cr/SiO2 thin films reacted with a bonding glass was investigated. When Fe-Hf-N/Cr/SiO2 films were annealed under 600℃ without the bonding glass, the compositions and the soft magnetic properties of Fe-Hf-N layers were not changed. However, after reaction with the bonding glass at 550℃, the soft magnetic properties of the film were degraded. At 600℃, the saturation magnetization of the reacted film decreased to 13.5 kG, and its coercivity increased to 4 Oe, and its effective permeability decreased to 700. It was founded that O diffused from the glass into the Fe-Hf-N layers during the reaction and generated HfO2 phases. It was considered that the soft magnetic properties of the Fe-Hf-N/Cr/SiO2 films reacted with the bonding glass were primarily degraded by the formation of the Fe-Hf-O-N layer of which the Fe content was below 60 at%, and secondarily degraded by the Fe-Hf-O-N layer above 70 at%.