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dc.contributor.authorPham Duc Cuong-
dc.contributor.author안효석-
dc.contributor.author김종희-
dc.contributor.author신경호-
dc.date.accessioned2024-01-21T07:45:17Z-
dc.date.available2024-01-21T07:45:17Z-
dc.date.created2022-01-10-
dc.date.issued2003-12-
dc.identifier.issn1229-9189-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/138033-
dc.titleTribological properties of sputtered boron carbide coating and the effect of CH4 reactive component of processing gas-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationKSTLE International Journal, v.4, no.2, pp.56 - 59-
dc.citation.titleKSTLE International Journal-
dc.citation.volume4-
dc.citation.number2-
dc.citation.startPage56-
dc.citation.endPage59-
dc.subject.keywordAuthorboron carbide coating-
dc.subject.keywordAuthorDC magnetron sputtering-
dc.subject.keywordAuthorprocessing gas-
dc.subject.keywordAuthorfriction and wear-
dc.subject.keywordAuthorX-ray photoelectron spectroscopy-
dc.subject.keywordAuthorauger electron spectroscopy-
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KIST Article > 2003
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