Grain size refinement of the diamond film deposited on the WC-Co cutting inserts using direct current biasing

Authors
PARK, JONG KEUKLee, Wook SeongBaik, Young Joon
Issue Date
2003-07
Publisher
ELSEVIER SCIENCE SA
Citation
SURFACE & COATINGS TECHNOLOGY, v.171, no.1-3, pp.1 - 5
Abstract
The effect of negative direct current (DC) bias has been investigated in the deposited diamond on WC-Co insert. SPGN type of WC-Co was used as a substrate where diamond was deposited by hot filament chemical vapor deposition at 60 Torr with H-2-3%CH4 gas. DC bias was applied to the insert with the range between 0 and -120 V The grain size of diamond film deposited on WC-Co insert decreased with the increase in negative bias voltage. The grain size was more refined near the edge than the center of the insert. Compared to other processing parameters such as pressure, temperature and carbon concentration, the biasing is a very effective way to reduce the grain size of diamond film, especially at the edge region where workpiece contacts during machining process. (C) 2003 Elsevier Science B.V All rights reserved.
Keywords
CHEMICAL-VAPOR-DEPOSITION; COATINGS; GROWTH; ADHESION; WC-Co insert; diamond film; DC bias; grain size refinement; edge
ISSN
0257-8972
URI
https://pubs.kist.re.kr/handle/201004/138430
DOI
10.1016/S0257-8972(03)00226-3
Appears in Collections:
KIST Article > 2003
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE