Suppression of secondary electrons from diamond by whisker formation

Authors
Lee, SWBaik, YJKang, CJJeon, D
Issue Date
2003-06-15
Publisher
ELSEVIER SCIENCE BV
Citation
APPLIED SURFACE SCIENCE, v.215, no.1-4, pp.265 - 268
Abstract
We have studied the secondary electron emission from chemical-vapor-deposited diamond films after etching the surface with an oxygen plasma. The etching not only removed hydrogen from the surface but also formed nano-sized diamond whiskers on the surface. As a result, the secondary electron ernission yield was halved. The trap of the secondary electrons by the porous medium was the reason for the decreased emission yield. The morphological effect to the secondary electron emission is discussed. (C) 2003 Elsevier Science B.V. All rights reserved.
Keywords
EMISSION; EMISSION; secondary electron emission; diamond film; whisker; dry etching
ISSN
0169-4332
URI
https://pubs.kist.re.kr/handle/201004/138464
DOI
10.1016/S0169-4332(03)00286-1
Appears in Collections:
KIST Article > 2003
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