Growth and properties of completely amorphous vanadium oxide cathode thin film with Pt co-sputtering method

Abstract

The effect of Pt co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, was investigated using glancing angle x-ray diffraction (GXRD), transmission electron microscopy (TENI), transmission electron diffraction (TED) and charge-discharge measurement. It was found that the Pt co-sputtering processes influence the growth mechanism as well as the characteristics Of V2O5 films. In addition, it was found that the Pt co-sputtered V2O5 cathode film exhibits cyclibility better than the undoped V2O5 cathode film, due to the absence of short range order, which is generally shown in undoped V2O5 cathode films. Possible explanations for the cycling behavior of the Pt doped V2O5 cathode film and Pt co-sputtering effect on the electrochemical properties of thin film batteries are suggested.