Formation of crack-free MoSi2/alpha-Si3N4 composite coating on Mo substrate by ammonia nitridation of Mo5Si3 layer followed by chemical vapor deposition of Si

Authors
Yoon, JKKim, GHByun, JYLee, JKKim, JS
Issue Date
2003-02-03
Publisher
ELSEVIER SCIENCE SA
Citation
SURFACE & COATINGS TECHNOLOGY, v.165, no.1, pp.81 - 89
Abstract
The formation of crack-free MOSi2/alpha-Si3N4 composite coating on a Mo substrate by ammonia nitridation followed by chemical vapor deposition (CVD) of Si on the Mo5Si3 layer at 1100 degreesC which was already formed on a Mo substrate was investigated using optical microscopy, field-emission scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (XTEM) and X-ray diffraction (XRD). This study demonstrated that the crack-free MoSi2/alpha-Si3N4 composite coating with some pores could be produced on a Mo substrate. Two composite layers (gamma-Mo2N/alpha-Si3N4 and Mo3Si/alpha-Si3N4) with different microstructure were formed by ammonia nitridation of Mo5Si3 layer, and the subsequent CVD of Si resulted in the formation of three composite layers (MoSi2/oblate-spheroidal type alpha-Si3N4, gamma-Mo2N/rod type alpha-Si3N4 and MO3Si/alpha-Si3N4). The volume percentage of alpha-Si3N4 phase in the MoSi2/alpha-Si3N4 composite coating ranged from 30 to 33%, suggesting that the thermal expansion coefficient of composite coating was close to that of Mo substrate. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords
THERMAL-EXPANSION; MOLYBDENUM; TEMPERATURE; BEHAVIOR; ALLOYS; MOSI2; THERMAL-EXPANSION; MOLYBDENUM; TEMPERATURE; BEHAVIOR; ALLOYS; MOSI2; ammonia nitridation and CVD of Si; crack-free MoSi2/alpha-Si3N4; composite coating; molybdenum
ISSN
0257-8972
URI
https://pubs.kist.re.kr/handle/201004/138826
DOI
10.1016/S0257-8972(02)00722-3
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KIST Article > 2003
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