DSpace at KIST: Effect of glycine adsorption on polishing of silicon nitride in chemical mechanical planarzation process

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DC Field	Value	Language
dc.contributor.author	김태은	-
dc.contributor.author	임건자	-
dc.contributor.author	이종호	-
dc.contributor.author	김주선	-
dc.contributor.author	이해원	-
dc.contributor.author	임대순	-
dc.date.accessioned	2024-01-21T09:34:12Z	-
dc.date.available	2024-01-21T09:34:12Z	-
dc.date.created	2022-01-10	-
dc.date.issued	2003-01	-
dc.identifier.issn	1229-7801	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/138917	-
dc.publisher	한국세라믹학회	-
dc.title	Effect of glycine adsorption on polishing of silicon nitride in chemical mechanical planarzation process	-
dc.title.alternative	CeO₂슬러리에서 glycine의 흡착이 질화규소 박막의 연마특성에 미치는 영향	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국세라믹학회지 (Journal of the Korean Ceramic Society), v.40, no.1, pp.77 - 80	-
dc.citation.title	한국세라믹학회지 (Journal of the Korean Ceramic Society)	-
dc.citation.volume	40	-
dc.citation.number	1	-
dc.citation.startPage	77	-
dc.citation.endPage	80	-
dc.description.journalRegisteredClass	kci	-
dc.subject.keywordAuthor	chemical mechanical planarization	-

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