Alignment of InAs quantum dots on a controllable strain-relaxed substrate using an InAs/GaAs superlattice

Authors
Kim, KMPark, YJPark, YMHyon, CKKim, EKPark, JH
Issue Date
2002-11-01
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.92, no.9, pp.5453 - 5456
Abstract
We fabricated InAs self-assembled quantum dots on a strained layer using molecular beam epitaxy. The controllable strained layer consisted of an InAs/GaAs superlattice and a GaAs spacer layer on a GaAs (001) substrate. We formed two-dimensional arrays of quantum dots along the <110> directions on the partially strain-relaxed layer that is formed using the superlattice system. The increase in the thickness of the partially strain-relaxed layer resulted in stronger alignment of the quantum dots. The aligned quantum dots are applicable to quantum devices, because they confine carriers well, in spite of the existence of dislocation networks. Strongly aligned quantum dots have a lower carrier transition energy because of their larger size and increased relaxation. (C) 2002 American Institute of Physics.
Keywords
CHEMICAL-VAPOR-DEPOSITION; MISFIT DISLOCATIONS; SELF-ORGANIZATION; FABRICATION; LAYER; CHEMICAL-VAPOR-DEPOSITION; MISFIT DISLOCATIONS; SELF-ORGANIZATION; FABRICATION; LAYER; InAs quantum dots; strain superlattice; alignment; critical thickness
ISSN
0021-8979
URI
https://pubs.kist.re.kr/handle/201004/139055
DOI
10.1063/1.1511821
Appears in Collections:
KIST Article > 2002
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