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dc.contributor.authorKim, HK-
dc.contributor.authorSeong, TY-
dc.contributor.authorLim, JH-
dc.contributor.authorOk, YW-
dc.contributor.authorCho, WI-
dc.contributor.authorShin, YH-
dc.contributor.authorYoon, YS-
dc.date.accessioned2024-01-21T10:08:43Z-
dc.date.available2024-01-21T10:08:43Z-
dc.date.created2021-09-01-
dc.date.issued2002-09-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/139266-
dc.description.abstractWe have fabricated all solid-state thin-film microsupercapacitors (TFSCs) using RuO2 electrodes and UPON electrolytes. The RuO2 electrodes were grown at oxygen gas flow ratios [O-2/(O-2 +Ar)] of 10% and 30%. Room-temperature charge-discharge measurements show that specific capacitance is dependent on the oxygen gas flow ratio. Glancing angle x-ray diffraction (GXRD) and transmission electron microscopy (TEM) results show that the RuO2 electrodes grown at 10% contain nanocrystallites (0.7-10 nm across) embedded in the amorphous matrix, while the electrodes grown at 30% are polycrystalline (with grains of 0.7-15 nm in diameter). Based on the GXRD, TEM, Auger electron spectroscopy depth profile, and scanning electron microscopy results, the oxygen flow ratio dependence of the cycling performance of the RuO2-based TFSCs are discussed in terms of the combined effects of the microstructures of the electrodes, interfacial products, and the surface morphology of the electrodes. (C) 2002 American Vacuum Society.-
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectRUTHENIUM OXIDE-
dc.titleCorrelation between the microstructures and the cycling performance of RuO2 electrodes for thin-film microsupercapacitors-
dc.typeArticle-
dc.identifier.doi10.1116/1.1500752-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.20, no.5, pp.1827 - 1832-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume20-
dc.citation.number5-
dc.citation.startPage1827-
dc.citation.endPage1832-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000178669200005-
dc.identifier.scopusid2-s2.0-0036026347-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusRUTHENIUM OXIDE-
dc.subject.keywordAuthorthin film supercapacitor-
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KIST Article > 2002
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