Surface analysis of polymers electrically improved by plasma-source ion-implantation

Authors
Lee, YHan, SLim, HKim, YKim, H
Issue Date
2002-08
Publisher
SPRINGER HEIDELBERG
Citation
ANALYTICAL AND BIOANALYTICAL CHEMISTRY, v.373, no.7, pp.595 - 600
Abstract
Inert-gas (Ar, Xe) and reactive-gas (O-2, N-2) plasma-source ion-implantation (PSII) treatment of PI, PET, PS-BD, and MPPO surfaces was performed at an ion energy of 30 keV to improve the electrical properties of the polymers. The effect of ion energy, treatment time, rf frequency, and power on the surface resistivity of polymer was investigated. Depending on ion energy, dose, and ion species, the surface resistivity of the film was reduced by several orders of magnitude. XPS, TOF-SIMS, and SEM were used to characterize MPPO surfaces treated by Ar-PSII and Xe-PSII. From these measurements it was found that the improvement in surface resistivity after PSII treatment was related to graphite carbon or crosslinked carbon-double-bond species formed on the surface.
Keywords
surface analysis; polymer modification; plasma-source ion-implantation; XPS; TOF-SIMS
ISSN
1618-2642
URI
https://pubs.kist.re.kr/handle/201004/139322
DOI
10.1007/s00216-002-1374-z
Appears in Collections:
KIST Article > 2002
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