Formation and characterization of self-patterned PZT film for applying to micro-mechanical detecting system

Authors
Ha, SMKim, WSPark, HHKim, TS
Issue Date
2002-03
Publisher
TAYLOR & FRANCIS LTD
Citation
FERROELECTRICS, v.273, pp.2729 - 2735
Abstract
One-layer self-patterned PZT film with 250 nm thickness was successfully fabricated using a photosensitive stock solution and UV-Irradiation process. Ethanol based-photosensitive stock solution having high molar concentration was prepared without any precipitation using diethanolamine (DEA) as stabilizer. A highly perpendicular edge shaped film was obtained through the self micro-patterning procedure. Especially the physical and electrical properties of self-patterned PZT films were compared with those of conventional PZT films. A highly densified microstructure with fine grains was obtained for both films but the self patterned one showed a highly (111) oriented microstructure. The remnant polarization of self-patterned film was slightly higher than that of conventionally processed film, however it showed a conventional and applicable ferroelectric properties.
Keywords
THIN-FILMS; THIN-FILMS; PZT; photosensitive; UV-irradiation; sol-gel
ISSN
0015-0193
URI
https://pubs.kist.re.kr/handle/201004/139762
Appears in Collections:
KIST Article > 2002
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