Magnetisation reversal dynamics in Ni80Fe20 thin films
- Authors
- Lee, WY; Shin, KH; Choi, BC; Bland, JAC
- Issue Date
- 2002-02
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.239, no.1-3, pp.103 - 105
- Abstract
- The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Angstrom) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A proportional to H(0)(x)Omega(beta)T(-gamma) with alpha approximate to 0.9, beta approximate to 0.8, and gamma approximate to 0.38 for both thicknesses. The exponents alpha and beta are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. (C) 2002 Elsevier Science B.V. All rights reserved.
- Keywords
- CO FILMS; HYSTERESIS; SYSTEMS; CU(001); CO FILMS; HYSTERESIS; SYSTEMS; CU(001); magnetisation reversal dynamics; magnetisation reversal process; dynamic scaling relation
- ISSN
- 0304-8853
- URI
- https://pubs.kist.re.kr/handle/201004/139839
- DOI
- 10.1016/S0304-8853(01)00586-8
- Appears in Collections:
- KIST Article > 2002
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