Magnetisation reversal dynamics in Ni80Fe20 thin films

Authors
Lee, WYShin, KHChoi, BCBland, JAC
Issue Date
2002-02
Publisher
ELSEVIER SCIENCE BV
Citation
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.239, no.1-3, pp.103 - 105
Abstract
The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Angstrom) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A proportional to H(0)(x)Omega(beta)T(-gamma) with alpha approximate to 0.9, beta approximate to 0.8, and gamma approximate to 0.38 for both thicknesses. The exponents alpha and beta are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords
CO FILMS; HYSTERESIS; SYSTEMS; CU(001); CO FILMS; HYSTERESIS; SYSTEMS; CU(001); magnetisation reversal dynamics; magnetisation reversal process; dynamic scaling relation
ISSN
0304-8853
URI
https://pubs.kist.re.kr/handle/201004/139839
DOI
10.1016/S0304-8853(01)00586-8
Appears in Collections:
KIST Article > 2002
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