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dc.contributor.author신용욱-
dc.contributor.author김상우-
dc.date.accessioned2024-01-21T11:12:05Z-
dc.date.available2024-01-21T11:12:05Z-
dc.date.created2021-09-06-
dc.date.issued2002-01-
dc.identifier.issn1225-0562-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/139871-
dc.description.abstractThe electrical properties of porous SiO2/ITO nano thin film were studied by complex impedance and conductive mechani는 were analyzed. According to the results of complex impedance, the activation energ of SiO2/ITO and Zn-SiO2/ITO were 0.309eV, 0.077eV in below 450℃ and 0.147 eV in over 450℃, respectively. In case of SiO2/ITO, slightly direct tunneling occurred at room temperature. The contributio for conduction was very tiny because of high barrier of silica. However, the conductivity abruptly increased in over 300℃ by Thermally assisted tunneling. In case of Zn-SiO2/ITO, high conductivity in 1.26 Ω-1.㎝-1 at room temperature appeared by space charge conduction of Frenkel-poole emission that Zn ions play a role as localized electron states.-
dc.publisher한국재료학회-
dc.title다공성 SiO2/Ito 나노박막의 전기적 특성-
dc.title.alternativeElectrical Properties of Porous SiO2/ITO Nano Films-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국재료학회지, v.12, no.1, pp.94 - 99-
dc.citation.title한국재료학회지-
dc.citation.volume12-
dc.citation.number1-
dc.citation.startPage94-
dc.citation.endPage99-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001199113-
dc.subject.keywordAuthorSiO2/ITO nano film-
dc.subject.keywordAuthorimpedance-
dc.subject.keywordAuthortunneling-
dc.subject.keywordAuthorZn ion-
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