Low-temperature crystallization induced by excimer laser irradiation of SrBi2Ta2O9 films

Authors
Seol, KSHiramatsu, HOhki, YChoi, IHKim, YT
Issue Date
2001-07
Publisher
MATERIALS RESEARCH SOCIETY
Citation
JOURNAL OF MATERIALS RESEARCH, v.16, no.7, pp.1883 - 1886
Abstract
Transition of a SrBi2Ta2O9 precursor film from amorphous to crystalline was induced by excimer laser irradiation. Both fluorite and perovskite crystalline structures in such films were obtained by excimer laser irradiation at substrate temperatures between 200 and 500 degreesC, Either an addition of excess bismuth in the precursor film or an increase in the substrate temperature enhanced the formation of the perovskite structure in the excimer laser-induced annealing process, resulting in the perovskite crystalline phase at a relatively lower temperature of 500 degreesC, Such a low temperature is preferred when SrBi2Ta2O9 is used in ferroelectric devices. The mechanism involved in this laser-induced crystallization is also discussed.
Keywords
THIN-FILMS; AMORPHOUS-SILICON; CAPACITORS; BISMUTH; THIN-FILMS; AMORPHOUS-SILICON; CAPACITORS; BISMUTH
ISSN
0884-2914
URI
https://pubs.kist.re.kr/handle/201004/140363
DOI
10.1557/JMR.2001.0257
Appears in Collections:
KIST Article > 2001
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