Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, MG | - |
dc.contributor.author | Yun, Z | - |
dc.contributor.author | Lyou, J | - |
dc.contributor.author | Cho, S | - |
dc.contributor.author | Park, YJ | - |
dc.contributor.author | Kim, EK | - |
dc.date.accessioned | 2024-01-21T12:13:57Z | - |
dc.date.available | 2024-01-21T12:13:57Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2001-06 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/140450 | - |
dc.description.abstract | We performed visible photoluminescence and scanning electron micrograph measurements on several porous poly-Si/Si and a-Si/Si structures. We found that the porous interfacial layer between the thin film and the substrate determined the optoelectronic properties for the structures. With the results, we present a model for porous structures based on the quantum confinement effect in silicon wires; the decreasing emission intensity and the redshift of photoluminescence originate from the silicon wires in the porous interface formed during all electrochemical process. | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | SILICON | - |
dc.subject | TEMPERATURE | - |
dc.subject | FABRICATION | - |
dc.subject | WAFERS | - |
dc.subject | FILMS | - |
dc.title | Visible photoluminescence from porous poly-Si/Si and amorphous-Si/Si structures | - |
dc.type | Article | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.38, no.6, pp.750 - 753 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 38 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 750 | - |
dc.citation.endPage | 753 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.description.journalRegisteredClass | other | - |
dc.identifier.wosid | 000169303600022 | - |
dc.identifier.scopusid | 2-s2.0-0035534304 | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | WAFERS | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | porous Si | - |
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