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dc.contributor.author전영민-
dc.contributor.author김동환-
dc.contributor.author조운조-
dc.contributor.author이석-
dc.date.accessioned2024-01-21T12:39:35Z-
dc.date.available2024-01-21T12:39:35Z-
dc.date.created2022-01-10-
dc.date.issued2001-03-
dc.identifier.issn1226-4776-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/140645-
dc.publisherOptical Society of Korea-
dc.titleX-ray emission spectroscopic analysis for crystallized amorphous silicon induced by excimer laser annealing-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitationJournal of the Optical Society of Korea, v.5, no.1, pp.1 - 4-
dc.citation.titleJournal of the Optical Society of Korea-
dc.citation.volume5-
dc.citation.number1-
dc.citation.startPage1-
dc.citation.endPage4-
dc.subject.keywordAuthorX-ray emission spectroscopy-
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KIST Article > 2001
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