Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, YW | - |
dc.contributor.author | Kim, GH | - |
dc.contributor.author | Han, S | - |
dc.contributor.author | Lee, Y | - |
dc.contributor.author | Cho, J | - |
dc.contributor.author | Rhee, SY | - |
dc.date.accessioned | 2024-01-21T12:43:36Z | - |
dc.date.available | 2024-01-21T12:43:36Z | - |
dc.date.created | 2021-09-04 | - |
dc.date.issued | 2001-02-02 | - |
dc.identifier.issn | 0257-8972 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/140714 | - |
dc.description.abstract | In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse. (C) 2001 Published by Elsevier Science B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | SURFACE MODIFICATION | - |
dc.title | Measurement of sheath expansion in plasma source ion implantation | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/S0257-8972(00)01035-5 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | SURFACE & COATINGS TECHNOLOGY, v.136, no.1-3, pp.97 - 101 | - |
dc.citation.title | SURFACE & COATINGS TECHNOLOGY | - |
dc.citation.volume | 136 | - |
dc.citation.number | 1-3 | - |
dc.citation.startPage | 97 | - |
dc.citation.endPage | 101 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000166464900021 | - |
dc.identifier.scopusid | 2-s2.0-0035254888 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | SURFACE MODIFICATION | - |
dc.subject.keywordAuthor | plasma source ion implantation | - |
dc.subject.keywordAuthor | time-dependent sheath | - |
dc.subject.keywordAuthor | ion wave | - |
dc.subject.keywordAuthor | Langmuir probe | - |
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