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dc.contributor.author김주형-
dc.contributor.author이전국-
dc.contributor.author안진호-
dc.date.accessioned2024-01-21T13:02:07Z-
dc.date.available2024-01-21T13:02:07Z-
dc.date.created2022-01-10-
dc.date.issued2001-01-
dc.identifier.issn1229-7801-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/140785-
dc.publisher한국세라믹학회-
dc.titleGrowing behavior of AIN thin film deposited by asymmetric bipolar pulsed dc reactive sputtering-
dc.title.alternative비대칭 펄스 직류 반응성 스퍼터링으로 증착된 AIN 박막의 성장 거동-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국세라믹학회지 = Journal of the Korean Ceramic Society, v.38, no.1, pp.61 - 67-
dc.citation.title한국세라믹학회지 = Journal of the Korean Ceramic Society-
dc.citation.volume38-
dc.citation.number1-
dc.citation.startPage61-
dc.citation.endPage67-
dc.description.journalRegisteredClasskci-
dc.subject.keywordAuthorAlN-
dc.subject.keywordAuthor박막형 고주파 부품-
dc.subject.keywordAuthor비대칭 펄스 직류 스퍼터링-
dc.subject.keywordAuthorpulse frequency-
dc.subject.keywordAuthorduty cycle-
dc.subject.keywordAuthorpulsed dc-
dc.subject.keywordAuthorarc-
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KIST Article > 2001
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