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Photoacid-induced fluorescence quenching: A new strategy for fluorescent imaging in polymer films

Authors

Kim, JM; Chang, TE; Kang, JH; Park, KH; Han, DK; Ahn, KD

Issue Date

2000-01

Publisher

WILEY-V C H VERLAG GMBH

Citation

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.39, no.10, pp.1780 - +

Keywords

CHEMICALLY AMPLIFIED RESISTS; MICROLITHOGRAPHY; AMPLIFICATION; DEPROTECTION; COPOLYMERS; CHEMICALLY AMPLIFIED RESISTS; MICROLITHOGRAPHY; AMPLIFICATION; DEPROTECTION; COPOLYMERS; fluorescence; heterocycles; polymers; thin films

ISSN

1433-7851

URI

https://pubs.kist.re.kr/handle/201004/141712

DOI

10.1002/(SICI)1521-3773(20000515)39:10<1780::AID-ANIE1780>3.0.CO;2-H

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KIST Article > 2000

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