Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ahn, KD | - |
dc.contributor.author | Chung, CM | - |
dc.date.accessioned | 2024-01-21T15:11:06Z | - |
dc.date.available | 2024-01-21T15:11:06Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 1999-08 | - |
dc.identifier.issn | 1022-1360 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/142030 | - |
dc.description.abstract | Synthesis and properties of photoacid generating polymers based on four sulfonyloxymaleimides (RsOMI), N-(tosyloxy)maleimide (TsOMI), N-(methanesulfonyloxy)maleimide (MsOMI), N-(trifluoromethanesulfonyloxy)maleimide (TfOMI), and N-(10-camphorsulfonyloxy)maleimide (CsOMI) are described. The RsOMI polymers photochemically produce corresponding sulfonic acids (RsOH), TsOH, MsOH, TfOH and 10-camphorsulfonic acid (CSA) which can catalyze deprotection of the acid-labile t-BOC groups in the same polymer chains via a chemical amplification process. The photoacid generating polymers with concurrent acid-labile groups offer great potential for applications in functional transformation and photoimaging. | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | SINGLE-COMPONENT RESISTS | - |
dc.subject | CHEMICAL AMPLIFICATION | - |
dc.subject | COPOLYMERS | - |
dc.subject | POLYMERIZATION | - |
dc.subject | CHEMISTRY | - |
dc.subject | SYSTEMS | - |
dc.subject | ROUTE | - |
dc.subject | ACID | - |
dc.title | Photoacid-generating sulfonyloxymaleimide polymers and their application to photoimaging | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/masy.19991420115 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | MACROMOLECULAR SYMPOSIA, v.142, pp.145 - 157 | - |
dc.citation.title | MACROMOLECULAR SYMPOSIA | - |
dc.citation.volume | 142 | - |
dc.citation.startPage | 145 | - |
dc.citation.endPage | 157 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000083646300014 | - |
dc.identifier.scopusid | 2-s2.0-0033450687 | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SINGLE-COMPONENT RESISTS | - |
dc.subject.keywordPlus | CHEMICAL AMPLIFICATION | - |
dc.subject.keywordPlus | COPOLYMERS | - |
dc.subject.keywordPlus | POLYMERIZATION | - |
dc.subject.keywordPlus | CHEMISTRY | - |
dc.subject.keywordPlus | SYSTEMS | - |
dc.subject.keywordPlus | ROUTE | - |
dc.subject.keywordPlus | ACID | - |
dc.subject.keywordAuthor | photoacid generation | - |
dc.subject.keywordAuthor | sulfonyloxymaleimide | - |
dc.subject.keywordAuthor | polymeric photoacid generator | - |
dc.subject.keywordAuthor | photoimaging | - |
dc.subject.keywordAuthor | chemical amplification | - |
dc.subject.keywordAuthor | photopolymers | - |
dc.subject.keywordAuthor | photoresist | - |
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