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dc.contributor.author김영식-
dc.contributor.author이윤희-
dc.contributor.author주병권-
dc.contributor.author성만영-
dc.contributor.author오명환-
dc.date.accessioned2024-01-21T15:34:41Z-
dc.date.available2024-01-21T15:34:41Z-
dc.date.created2022-01-10-
dc.date.issued1999-05-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/142207-
dc.publisher대한전기학회-
dc.titleInfluences of plasma treatment on the electrical characteristics of rf-magnetron sputtered BaTa2O6 thin films-
dc.title.alternative플라즈마 표면 처리가 BaTa2O6 박막의 전기적 특성에 미치는 효과에 관한 연구-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation대한전기학회논문지 : 전기물성,응용부문 C = The Transactions of The Korean Institute of Electrical Engineers, v.48C, no.5, pp.319 - 325-
dc.citation.title대한전기학회논문지 : 전기물성,응용부문 C = The Transactions of The Korean Institute of Electrical Engineers-
dc.citation.volume48C-
dc.citation.number5-
dc.citation.startPage319-
dc.citation.endPage325-
dc.subject.keywordAuthorFED-
dc.subject.keywordAuthorBaTa2O6 thin films-
dc.subject.keywordAuthorACTFELD-
dc.subject.keywordAuthorOxygen Plasma treatment-
dc.subject.keywordAuthorHigh dielectric donstant-
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