Influences of plasma treatment on the electrical characteristics of rf-magnetron sputtered BaTa2O6 thin films

Other Titles
플라즈마 표면 처리가 BaTa2O6 박막의 전기적 특성에 미치는 효과에 관한 연구
Authors
김영식이윤희주병권성만영오명환
Issue Date
1999-05
Publisher
대한전기학회
Citation
대한전기학회논문지 : 전기물성,응용부문 C = The Transactions of The Korean Institute of Electrical Engineers, v.48C, no.5, pp.319 - 325
Keywords
FED; BaTa2O6 thin films; ACTFELD; Oxygen Plasma treatment; High dielectric donstant
URI
https://pubs.kist.re.kr/handle/201004/142207
Appears in Collections:
KIST Article > Others
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