Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, MG | - |
dc.contributor.author | Lee, KR | - |
dc.contributor.author | Eun, KY | - |
dc.date.accessioned | 2024-01-21T16:01:30Z | - |
dc.date.available | 2024-01-21T16:01:30Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 1999-02 | - |
dc.identifier.issn | 0257-8972 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/142430 | - |
dc.description.abstract | The tribological behavior between silicon-incorporated diamond-like carbon (Si-DLC) films and a steel ball was investigated from the viewpoint of tribochemical reaction. The films were deposited on Si(100) wafers from radio-frequency glow discharge of mixtures of benzene and dilute silane gases. The tribological behavior was investigated by using a ball-on-disk type wear rig in ambient atmosphere. The variation of the friction coefficient with the number of contact cycles was compared among films having of various silicon concentrations from 0 to 9.5 at%. It was observed that the friction coefficient decreased with increasing silicon concentration in the films. Furthermore, the friction behavior became more stable even at a small amount of silicon less than 0.5 at% incorporated. By analyzing the composition of the debris formed, we could conclude that the low and stabilized friction coefficient is intimately related to the formation of the silicon-rich oxide debris. These results are consistent with a previously suggested mechanism that the hydrated silica debris results in the low friction coefficient in a humid environment. (C) 1999 Elsevier Science S.A. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | COATINGS | - |
dc.title | Tribological behavior of silicon-incorporated diamond-like carbon films | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/S0257-8972(98)00770-1 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | SURFACE & COATINGS TECHNOLOGY, v.112, no.1-3, pp.204 - 209 | - |
dc.citation.title | SURFACE & COATINGS TECHNOLOGY | - |
dc.citation.volume | 112 | - |
dc.citation.number | 1-3 | - |
dc.citation.startPage | 204 | - |
dc.citation.endPage | 209 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000079712200041 | - |
dc.identifier.scopusid | 2-s2.0-0033080370 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | COATINGS | - |
dc.subject.keywordAuthor | mechanism | - |
dc.subject.keywordAuthor | PACVD | - |
dc.subject.keywordAuthor | Si-DLC films | - |
dc.subject.keywordAuthor | tribochemical reaction | - |
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