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dc.contributor.authorKim, MG-
dc.contributor.authorLee, KR-
dc.contributor.authorEun, KY-
dc.date.accessioned2024-01-21T16:01:30Z-
dc.date.available2024-01-21T16:01:30Z-
dc.date.created2021-09-05-
dc.date.issued1999-02-
dc.identifier.issn0257-8972-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/142430-
dc.description.abstractThe tribological behavior between silicon-incorporated diamond-like carbon (Si-DLC) films and a steel ball was investigated from the viewpoint of tribochemical reaction. The films were deposited on Si(100) wafers from radio-frequency glow discharge of mixtures of benzene and dilute silane gases. The tribological behavior was investigated by using a ball-on-disk type wear rig in ambient atmosphere. The variation of the friction coefficient with the number of contact cycles was compared among films having of various silicon concentrations from 0 to 9.5 at%. It was observed that the friction coefficient decreased with increasing silicon concentration in the films. Furthermore, the friction behavior became more stable even at a small amount of silicon less than 0.5 at% incorporated. By analyzing the composition of the debris formed, we could conclude that the low and stabilized friction coefficient is intimately related to the formation of the silicon-rich oxide debris. These results are consistent with a previously suggested mechanism that the hydrated silica debris results in the low friction coefficient in a humid environment. (C) 1999 Elsevier Science S.A. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectCOATINGS-
dc.titleTribological behavior of silicon-incorporated diamond-like carbon films-
dc.typeArticle-
dc.identifier.doi10.1016/S0257-8972(98)00770-1-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSURFACE & COATINGS TECHNOLOGY, v.112, no.1-3, pp.204 - 209-
dc.citation.titleSURFACE & COATINGS TECHNOLOGY-
dc.citation.volume112-
dc.citation.number1-3-
dc.citation.startPage204-
dc.citation.endPage209-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000079712200041-
dc.identifier.scopusid2-s2.0-0033080370-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusCOATINGS-
dc.subject.keywordAuthormechanism-
dc.subject.keywordAuthorPACVD-
dc.subject.keywordAuthorSi-DLC films-
dc.subject.keywordAuthortribochemical reaction-
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