Tribological behavior of silicon-incorporated diamond-like carbon films
- Authors
- Kim, MG; Lee, KR; Eun, KY
- Issue Date
- 1999-02
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- SURFACE & COATINGS TECHNOLOGY, v.112, no.1-3, pp.204 - 209
- Abstract
- The tribological behavior between silicon-incorporated diamond-like carbon (Si-DLC) films and a steel ball was investigated from the viewpoint of tribochemical reaction. The films were deposited on Si(100) wafers from radio-frequency glow discharge of mixtures of benzene and dilute silane gases. The tribological behavior was investigated by using a ball-on-disk type wear rig in ambient atmosphere. The variation of the friction coefficient with the number of contact cycles was compared among films having of various silicon concentrations from 0 to 9.5 at%. It was observed that the friction coefficient decreased with increasing silicon concentration in the films. Furthermore, the friction behavior became more stable even at a small amount of silicon less than 0.5 at% incorporated. By analyzing the composition of the debris formed, we could conclude that the low and stabilized friction coefficient is intimately related to the formation of the silicon-rich oxide debris. These results are consistent with a previously suggested mechanism that the hydrated silica debris results in the low friction coefficient in a humid environment. (C) 1999 Elsevier Science S.A. All rights reserved.
- Keywords
- CHEMICAL-VAPOR-DEPOSITION; COATINGS; CHEMICAL-VAPOR-DEPOSITION; COATINGS; mechanism; PACVD; Si-DLC films; tribochemical reaction
- ISSN
- 0257-8972
- URI
- https://pubs.kist.re.kr/handle/201004/142430
- DOI
- 10.1016/S0257-8972(98)00770-1
- Appears in Collections:
- KIST Article > Others
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