DSpace at KIST: Reactive ion etching characteristics of permalloy thin films

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DC Field	Value	Language
dc.contributor.author	김성동	-
dc.contributor.author	이정중	-
dc.contributor.author	임상호	-
dc.contributor.author	김희중	-
dc.date.accessioned	2024-01-21T16:06:09Z	-
dc.date.available	2024-01-21T16:06:09Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1999-01	-
dc.identifier.issn	0285-0192	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/142512	-
dc.title	Reactive ion etching characteristics of permalloy thin films	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	日本應用磁氣學會誌 = Journal of the magnetics society of Japan, v.23, no.1-2, pp.252 - 254	-
dc.citation.title	日本應用磁氣學會誌 = Journal of the magnetics society of Japan	-
dc.citation.volume	23	-
dc.citation.number	1-2	-
dc.citation.startPage	252	-
dc.citation.endPage	254	-
dc.subject.keywordAuthor	reactive ion etching	-
dc.subject.keywordAuthor	permalloy thin films	-
dc.subject.keywordAuthor	etching rate	-
dc.subject.keywordAuthor	etching damage	-
dc.subject.keywordAuthor	coercivity	-

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