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dc.contributor.authorKang, HK-
dc.contributor.authorKim, TH-
dc.contributor.authorMoon, S-
dc.contributor.authorJung, JH-
dc.contributor.authorOh, MH-
dc.date.accessioned2024-01-21T16:12:26Z-
dc.date.available2024-01-21T16:12:26Z-
dc.date.created2021-09-03-
dc.date.issued1999-01-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/142622-
dc.description.abstractThe nitrogen-doped diamond-like-carbon (DLC) coating on the molybdenum field emitter arrays (Mo-FEAs) was reported to improve the electron emission characteristics. The plasma enhanced chemical vapor deposition method using a layer-by-layer technique was applied to deposit DLC films. Field emission characteristics were measured and the possibility of applying N-doped DLC coated emitters to high frequency vacuum devices was reported. The turn-on voltage of DLC coated FEAs was decreased from 75 to 55 V and the emission current was more stable than that of noncoated FEAs. The total transconductance of FEAs was increased and the effective work function of emitters was reduced by the N-type DLC coating. (C) 1999 American Vacuum Society. [S0734-211X(99)02101-0].-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectARRAY DEVELOPMENT-
dc.subjectPLASMA-
dc.subjectFILM-
dc.subjectSTABILITY-
dc.titleEnhancement of emission characteristics for field emitters by N-doped hydrogen-free diamond-like-carbon coating-
dc.typeArticle-
dc.identifier.doi10.1116/1.590507-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.17, no.1, pp.246 - 249-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume17-
dc.citation.number1-
dc.citation.startPage246-
dc.citation.endPage249-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000078654300043-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusARRAY DEVELOPMENT-
dc.subject.keywordPlusPLASMA-
dc.subject.keywordPlusFILM-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordAuthorenhancement-
dc.subject.keywordAuthorfield emission-
dc.subject.keywordAuthorhydrogen-free-
dc.subject.keywordAuthorDLC-
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