Negative pattern generation technique by laser beam writing for integrated optics
- Authors
- Park, KH; Kim, MW; Byun, YT; Kim, SH; Cho, WR; Park, SH; Kim, U; Choi, SS
- Issue Date
- 1998-09
- Publisher
- JAPAN J APPLIED PHYSICS
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.37, no.9A, pp.4844 - 4845
- Abstract
- A novel technique for fabricating negative tone patterns fur waveguide devices, using laser beam writing is proposed. An optoelectronic device pattern with good contrast and a smooth curve is generated. Our proposed technique can extend the applications of laser beam writing to the fabrication of the optoelectronic devices.
- Keywords
- laser beam writing; lithography; integrated optics; waveguide; semiconductor
- ISSN
- 0021-4922
- URI
- https://pubs.kist.re.kr/handle/201004/142889
- DOI
- 10.1143/JJAP.37.4844
- Appears in Collections:
- KIST Article > Others
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