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dc.contributor.authorKim, HB-
dc.contributor.authorCho, MH-
dc.contributor.authorWhangbo, SW-
dc.contributor.authorWhang, CN-
dc.contributor.authorChoi, SC-
dc.contributor.authorChoi, WK-
dc.contributor.authorSong, JH-
dc.contributor.authorKim, SO-
dc.date.accessioned2024-01-21T17:06:08Z-
dc.date.available2024-01-21T17:06:08Z-
dc.date.created2021-09-03-
dc.date.issued1998-05-18-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143065-
dc.description.abstractThe heteroepitaxially grown yttrium oxide layer by an ionized cluster beam (ICB) on a Si(100) substrate was investigated by Rutherford backscattering spectrometry (RBS)/channeling. The channeling minimum value (chi(min)) of the Y2O3 layer on Si(100) is 0.28, and this is the smallest value among those reported. From the channeling polar plots, it is found that Y2O3 film grown on Si(100) oriented with (110) direction and has a double domain structure. The (110) axis of Y2O3 layer is exactly parallel to the [100] axis of the Si substrate. It is also observed that the interface region of Y2O3 film has more crystalline defects than the surface region. (C) 1998 Elsevier Science S.A. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectTHIN-FILMS-
dc.subjectDEPOSITION-
dc.subjectSUBSTRATE-
dc.subjectSILICON-
dc.titleRBS/channeling studies on the heteroepitaxially grown Y2O3 film on Si(100)-
dc.typeArticle-
dc.identifier.doi10.1016/S0040-6090(98)00364-2-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.320, no.2, pp.169 - 172-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume320-
dc.citation.number2-
dc.citation.startPage169-
dc.citation.endPage172-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000074624900004-
dc.identifier.scopusid2-s2.0-0032072348-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeLetter-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusSUBSTRATE-
dc.subject.keywordPlusSILICON-
dc.subject.keywordAuthorheteroepitaxially grown-
dc.subject.keywordAuthorcrystalline defects-
dc.subject.keywordAuthordouble domain structure-
dc.subject.keywordAuthorytrrium oxide-
dc.subject.keywordAuthorSi substrate-
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