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dc.contributor.authorS. Im*-
dc.contributor.authorM. S. Oh-
dc.contributor.author김효배-
dc.contributor.author송종한-
dc.date.accessioned2024-01-21T17:10:37Z-
dc.date.available2024-01-21T17:10:37Z-
dc.date.created2022-01-10-
dc.date.issued1998-04-
dc.identifier.issn1225-8822-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143142-
dc.languageEnglish-
dc.publisher한국진공학회-
dc.titleEnhanced relaxation of strain in BF2+ implanted Ge0.06Si0.94-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국진공학회지, v.2, no.1, pp.37 - 42-
dc.citation.title한국진공학회지-
dc.citation.volume2-
dc.citation.number1-
dc.citation.startPage37-
dc.citation.endPage42-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthor키워드-
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