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dc.contributor.authorLee, C.-W.-
dc.contributor.authorShin, J.-H.-
dc.contributor.authorKang, J.-H.-
dc.contributor.authorKim, J.-M.-
dc.contributor.authorHan, D.-K.-
dc.contributor.authorAhn, K.-D.-
dc.date.accessioned2024-01-21T17:42:07Z-
dc.date.available2024-01-21T17:42:07Z-
dc.date.created2021-09-02-
dc.date.issued1998-01-
dc.identifier.issn0914-9244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143439-
dc.description.abstract[No abstract available]-
dc.languageEnglish-
dc.publisherTokai University-
dc.titleNew single-component resists based on functional polynorborneneimides by chemical amplification for deep uv lithography-
dc.typeArticle-
dc.identifier.doi10.2494/photopolymer.11.405-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJournal of Photopolymer Science and Technology, v.11, no.3, pp.405 - 408-
dc.citation.titleJournal of Photopolymer Science and Technology-
dc.citation.volume11-
dc.citation.number3-
dc.citation.startPage405-
dc.citation.endPage408-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-0000689255-
dc.type.docTypeArticle-
dc.subject.keywordAuthorDeep uv resists-
dc.subject.keywordAuthorNorborneneimide polymers-
dc.subject.keywordAuthorPolymeric photoacid generators-
dc.subject.keywordAuthorSingle-component resists-
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