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New single-component resists based on functional polynorborneneimides by chemical amplification for deep uv lithography

Authors: Lee, C.-W.; Shin, J.-H.; Kang, J.-H.; Kim, J.-M.; Han, D.-K.; Ahn, K.-D.

Issue Date: 1998-01

Publisher: Tokai University

Citation: Journal of Photopolymer Science and Technology, v.11, no.3, pp.405 - 408

Abstract: [No abstract available]

Keywords: Deep uv resists; Norborneneimide polymers; Polymeric photoacid generators; Single-component resists

ISSN: 0914-9244

URI: https://pubs.kist.re.kr/handle/201004/143439

DOI: 10.2494/photopolymer.11.405

Appears in Collections:: KIST Article > Others

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