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dc.contributor.authorAhn, K.-D.-
dc.contributor.authorRang, J.-H.-
dc.contributor.authorLee, C.-W.-
dc.contributor.authorKim, J.-M.-
dc.contributor.authorHan, D.-K.-
dc.contributor.authorLee, J.-H.-
dc.contributor.authorCho, I.-
dc.contributor.authorMoon, S.-Y.-
dc.contributor.authorKoo, J.-S.-
dc.contributor.authorLee, S.-K.-
dc.date.accessioned2024-01-21T17:42:21Z-
dc.date.available2024-01-21T17:42:21Z-
dc.date.created2021-09-02-
dc.date.issued1998-01-
dc.identifier.issn0914-9244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143443-
dc.description.abstract[No abstract available]-
dc.languageEnglish-
dc.publisherTokai University-
dc.titleNew alicyclic polymers based on protected dinorbornene monomers for application as deep UV resists-
dc.typeArticle-
dc.identifier.doi10.2494/photopolymer.11.499-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJournal of Photopolymer Science and Technology, v.11, no.3, pp.499 - 504-
dc.citation.titleJournal of Photopolymer Science and Technology-
dc.citation.volume11-
dc.citation.number3-
dc.citation.startPage499-
dc.citation.endPage504-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-0001474362-
dc.type.docTypeArticle-
dc.subject.keywordAuthorAlicyclic polymers-
dc.subject.keywordAuthorArf resist-
dc.subject.keywordAuthorProtected dinorbornene polymers-
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