Study on the growth characteristics of thick GaN on sapphire substrate using hydride vapor phase epitaxy

Other Titles
Hydride vapor phase epitaxy를 이용한 sapphire 기판 상에 GaN 후막의 성장특성에 관한 연구
Authors
이정욱유지범변동진금동화
Issue Date
1997-06
Citation
한국재료학회지 = Korean journal of materials research, v.7, no.6, pp.492 - 497
Keywords
GaN film; hydride vapor phase epitaxial growth; ZnO buffer layer
URI
https://pubs.kist.re.kr/handle/201004/143753
Appears in Collections:
KIST Article > Others
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