Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yom, SS | - |
dc.contributor.author | Wang, CH | - |
dc.contributor.author | Kim, YT | - |
dc.date.accessioned | 2024-01-21T19:04:46Z | - |
dc.date.available | 2024-01-21T19:04:46Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 1997-01 | - |
dc.identifier.issn | 1058-4587 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/144153 | - |
dc.description.abstract | We deposited PbTiO3 thin films using beta-diketonate complex of Pb(tmhd)(2) and titanium-isopropoxide as source precursors at substrate temperature range from 430 degrees C to 630 degrees C by MOCVD. The PbTiO3 films on Pt/Ti/SiO2/Si substrates at above 500 degrees C showed polycrystalline behavior. The PbTiO3 films on Pt/Ti/SiO2/Si and fused silica glass substrates grown at 430 degrees C included abnormal circular-shaped crystalline phases which were randomly embedded in amorphous PbTiO3 film. From Auger electron spectroscopy, transmission electron microscopy and micro-Raman spectroscopy results, the circular-shaped phase is an aggregation of micro-crystalline PbTiO3 phases which are embedded in the amorphous matrix. | - |
dc.language | English | - |
dc.publisher | GORDON BREACH SCI PUBL LTD | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | LOW-TEMPERATURE | - |
dc.subject | P-SI | - |
dc.subject | ELECTRICAL-PROPERTIES | - |
dc.subject | STRUCTURAL-PROPERTIES | - |
dc.subject | OPTICAL-PROPERTIES | - |
dc.subject | RAMAN-SPECTRA | - |
dc.subject | GLASS | - |
dc.title | Formation of circular-shaped crystalline phases embedded in amorphous PbTiO3 thin films grown by MOCVD | - |
dc.type | Article | - |
dc.identifier.doi | 10.1080/10584589708019979 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | INTEGRATED FERROELECTRICS, v.14, no.1-4, pp.77 - 83 | - |
dc.citation.title | INTEGRATED FERROELECTRICS | - |
dc.citation.volume | 14 | - |
dc.citation.number | 1-4 | - |
dc.citation.startPage | 77 | - |
dc.citation.endPage | 83 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1997WR71400010 | - |
dc.identifier.scopusid | 2-s2.0-0031334281 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | LOW-TEMPERATURE | - |
dc.subject.keywordPlus | P-SI | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | STRUCTURAL-PROPERTIES | - |
dc.subject.keywordPlus | OPTICAL-PROPERTIES | - |
dc.subject.keywordPlus | RAMAN-SPECTRA | - |
dc.subject.keywordPlus | GLASS | - |
dc.subject.keywordAuthor | MOCVD | - |
dc.subject.keywordAuthor | PbTiO3 | - |
dc.subject.keywordAuthor | films | - |
dc.subject.keywordAuthor | micro-crystalline | - |
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