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dc.contributor.authorKang, WN-
dc.contributor.authorKim, YH-
dc.contributor.authorKim, CH-
dc.contributor.authorJang, JW-
dc.contributor.authorKim, IT-
dc.contributor.authorChoi, SS-
dc.contributor.authorHahn, TS-
dc.date.accessioned2024-01-21T19:09:56Z-
dc.date.available2024-01-21T19:09:56Z-
dc.date.created2021-09-05-
dc.date.issued1996-11-01-
dc.identifier.issn0261-8028-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144240-
dc.languageEnglish-
dc.publisherCHAPMAN HALL LTD-
dc.subjectMICROSTRUCTURE-
dc.subjectLAALO3-
dc.subjectMOCVD-
dc.titleThickness dependence of crystalline orientation in YBa2Cu3Ox thin films grown by metalorganic chemical vapour deposition-
dc.typeArticle-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS SCIENCE LETTERS, v.15, no.21, pp.1898 - 1901-
dc.citation.titleJOURNAL OF MATERIALS SCIENCE LETTERS-
dc.citation.volume15-
dc.citation.number21-
dc.citation.startPage1898-
dc.citation.endPage1901-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1996VR27300022-
dc.identifier.scopusid2-s2.0-0030285257-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusMICROSTRUCTURE-
dc.subject.keywordPlusLAALO3-
dc.subject.keywordPlusMOCVD-
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