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dc.contributor.authorPark, HW-
dc.contributor.authorJu, BK-
dc.contributor.authorLee, YH-
dc.contributor.authorPark, JH-
dc.contributor.authorOh, MH-
dc.date.accessioned2024-01-21T19:11:47Z-
dc.date.available2024-01-21T19:11:47Z-
dc.date.created2021-09-05-
dc.date.issued1996-10-01-
dc.identifier.issn0021-4922-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144271-
dc.description.abstractUniform and reproducible silicon tip arrays were fabricated using the reactive ion etching followed by the reoxidation sharpening. Molybdenum was coated on the some of the silicon tip array. Current-voltage characteristics and current fluctuations were tested in the high vacuum level. Turn-on voltage of the uncoated tip was 35 V and maximum current was 1 mA, while turn-on voltage of the coated tip was 15 V and maximum current was 6 mA. While uncoated silicon tip was destroyed after 13 minutes after operation and showed rapid lowering of emission current, coated tip showed stable emission characteristics. Obtained currents were proved to be field emission currents using the Fowler-Nordheim plot studies.-
dc.languageEnglish-
dc.publisherJAPAN SOC APPLIED PHYSICS-
dc.subjectSENSORS-
dc.subjectTIPS-
dc.titleEmission characteristics of the molybdenum-coated silicon field emitter array-
dc.typeArticle-
dc.identifier.doi10.1143/JJAP.35.L1301-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, v.35, no.10A, pp.L1301 - L1304-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS-
dc.citation.volume35-
dc.citation.number10A-
dc.citation.startPageL1301-
dc.citation.endPageL1304-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1996VM31000021-
dc.identifier.scopusid2-s2.0-0030260603-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusSENSORS-
dc.subject.keywordPlusTIPS-
dc.subject.keywordAuthortip-
dc.subject.keywordAuthorreactive ion etching-
dc.subject.keywordAuthorsharpening-
dc.subject.keywordAuthorcurrent fluctuation-
dc.subject.keywordAuthorFowler-Nordheim-
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