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dc.contributor.authorMoon, SW-
dc.contributor.authorMann, CM-
dc.contributor.authorMaddison, BJ-
dc.contributor.authorTurcu, ICE-
dc.contributor.authorAllot, R-
dc.contributor.authorHuq, SE-
dc.contributor.authorLisi, N-
dc.date.accessioned2024-01-21T19:13:49Z-
dc.date.available2024-01-21T19:13:49Z-
dc.date.created2021-09-01-
dc.date.issued1996-09-12-
dc.identifier.issn0013-5194-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144306-
dc.description.abstractA novel process using embedded x-ray masks that allows the fabrication of 3D terahertz waveguide components is demonstrated. X-rays produced by a laser plasma source are used to expose a chenically amplified resist. To produce structures with the required depth (similar to 50 mu m) a cyclic exposure and development technique is used. A representative waveguide cavity intended for operation at 2.5THz is realised.-
dc.languageEnglish-
dc.publisherIEE-INST ELEC ENG-
dc.titleTerahertz waveguide components fabricated using a 3D x-ray microfabrication technique-
dc.typeArticle-
dc.identifier.doi10.1049/el:19961166-
dc.description.journalClass1-
dc.identifier.bibliographicCitationELECTRONICS LETTERS, v.32, no.19, pp.1794 - 1795-
dc.citation.titleELECTRONICS LETTERS-
dc.citation.volume32-
dc.citation.number19-
dc.citation.startPage1794-
dc.citation.endPage1795-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1996VJ62800036-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalResearchAreaEngineering-
dc.type.docTypeArticle-
dc.subject.keywordAuthorx-ray lithography-
dc.subject.keywordAuthoroptical waveguides-
dc.subject.keywordAuthorwaveguides-
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