Full metadata record

DC Field Value Language
dc.contributor.authorPark, KC-
dc.contributor.authorMoon, JH-
dc.contributor.authorJang, J-
dc.contributor.authorOh, MH-
dc.date.accessioned2024-01-21T19:33:54Z-
dc.date.available2024-01-21T19:33:54Z-
dc.date.created2022-01-11-
dc.date.issued1996-06-17-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144414-
dc.description.abstractHydrogen-free diamond-like carbon (DLC) films were deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition (PECVD), i.e., the alternative deposition of thin DLC layer and subsequent CF4 plasma exposure on its surface. The hydrogen-foe DLC could be grown on the Si wafer by repeated deposition of the 5 nm DLC layer and subsequent 200 s CF4 plasma exposure on its surface. On the other hand, the conventional DLC deposited by PECVD contains 25 at. % hydrogen inside. The CF4 plasma exposure on the thin DLC layer appears to etch weak C-C bonds and break hydrogen bonds, resulting in a widening optical band gap and increasing conductivity activation energy. (C) 1996 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectAMORPHOUS-CARBON-
dc.titleDeposition of hydrogen-free diamond-like carbon film by plasma enhanced chemical vapor deposition-
dc.typeArticle-
dc.identifier.doi10.1063/1.116648-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.68, no.25, pp.3594 - 3595-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume68-
dc.citation.number25-
dc.citation.startPage3594-
dc.citation.endPage3595-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1996UR15300024-
dc.identifier.scopusid2-s2.0-0000512059-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusAMORPHOUS-CARBON-
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE