DSpace at KIST: Post-growth annealing effects of low-temperature grown TiO//2 thin films on InP substrate by low-pressure metalorganic chemical vapor deposition.

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DC Field	Value	Language
dc.contributor.author	김은규	-
dc.contributor.author	민석기	-
dc.contributor.author	염상섭	-
dc.contributor.author	손맹호	-
dc.contributor.author	한영기	-
dc.contributor.author	왕채현	-
dc.date.accessioned	2024-01-21T19:37:59Z	-
dc.date.available	2024-01-21T19:37:59Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1996-04	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/144483	-
dc.title	Post-growth annealing effects of low-temperature grown TiO//2 thin films on InP substrate by low-pressure metalorganic chemical vapor deposition.	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	J. appl. phys., v.v. 79, no.no. 8, pp.4459 - 4461	-
dc.citation.title	J. appl. phys.	-
dc.citation.volume	v. 79	-
dc.citation.number	no. 8	-
dc.citation.startPage	4459	-
dc.citation.endPage	4461	-
dc.subject.keywordAuthor	post-growth annealing	-

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