Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Kim, SI | - |
dc.contributor.author | Kim, MS | - |
dc.contributor.author | Min, SK | - |
dc.date.accessioned | 2024-01-21T19:40:21Z | - |
dc.date.available | 2024-01-21T19:40:21Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 1996-03 | - |
dc.identifier.issn | 0038-1098 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/144524 | - |
dc.description.abstract | We have calculated the lattice constant, strain, and critical layer thickness of heavily carbon (C)-doped GaAs epilayers as a function of hole concentration. The lattice constant of C-doped GaAs epilayers decreased with increasing hole concentration due to strain by carbon incorporation where carbon has a smaller covalent radii than gallium and arsenic. We also have discussed the relationship between hole concentration and critical layer thickness (L(c)) by the excess stress and Matthews-Blakeslee model. We have calculated not only for the pure case but also 10% compensated case. In compensated epilayers the carbon a toms exist not only on the arsenic sites but also on the gallium sites. As we compared the experimental data of C-doped GaAs with the calculated results, the excess stress model is more agreeable than the Matthews-Blakeslee model. The excess stress, at which surface cross hatching could be seen from the surface, was sigma(exc)/mu = 0.0021 for pure case and 0.0024 for 10% compensated case. Thus we could identify these excess stresses as the critical excess stresses for C-doped GaAs epilayers. | - |
dc.language | English | - |
dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | - |
dc.subject | P-TYPE GAAS | - |
dc.subject | PHOTOLUMINESCENCE | - |
dc.subject | EPITAXY | - |
dc.title | Strain and critical layer thickness analysis of carbon-doped GaAs | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/0038-1098(95)00671-0 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | SOLID STATE COMMUNICATIONS, v.97, no.10, pp.875 - 878 | - |
dc.citation.title | SOLID STATE COMMUNICATIONS | - |
dc.citation.volume | 97 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 875 | - |
dc.citation.endPage | 878 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1996TT72100011 | - |
dc.identifier.scopusid | 2-s2.0-0030107286 | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | P-TYPE GAAS | - |
dc.subject.keywordPlus | PHOTOLUMINESCENCE | - |
dc.subject.keywordPlus | EPITAXY | - |
dc.subject.keywordAuthor | MOCVD | - |
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