Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안광덕 | - |
| dc.date.accessioned | 2024-01-21T19:41:08Z | - |
| dc.date.available | 2024-01-21T19:41:08Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1996-02 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/144537 | - |
| dc.title | Photoresist materials for ULSI microlithography. | - |
| dc.title.alternative | 고집적 반도체 초미세가공용 포토레지스트 재료 = | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | 월간 반도체, pp.29 - 44 | - |
| dc.citation.title | 월간 반도체 | - |
| dc.citation.startPage | 29 | - |
| dc.citation.endPage | 44 | - |
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