DSpace at KIST: Study on formation of W-silicide in the doped-phosphorus poly-Si/SiO//2/Si-substrate.

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DC Field	Value	Language
dc.contributor.author	정회환	-
dc.contributor.author	주병권	-
dc.contributor.author	오명환	-
dc.contributor.author	정관수	-
dc.date.accessioned	2024-01-21T20:01:29Z	-
dc.date.available	2024-01-21T20:01:29Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1996-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/144651	-
dc.title	Study on formation of W-silicide in the doped-phosphorus poly-Si/SiO//2/Si-substrate.	-
dc.title.alternative	인이 주입된 poly-Si/SiO//2/Si 기판에서 텅스텐 실리사이드의 형성에 관한 연구 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	전자공학회논문지, v.제 33 권 A 편, pp.126 - 134	-
dc.citation.title	전자공학회논문지	-
dc.citation.volume	제 33 권 A 편	-
dc.citation.startPage	126	-
dc.citation.endPage	134	-

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