Study on formation of W-silicide in the doped-phosphorus poly-Si/SiO//2/Si-substrate.

Other Titles
인이 주입된 poly-Si/SiO//2/Si 기판에서 텅스텐 실리사이드의 형성에 관한 연구 =
Authors
정회환주병권오명환정관수
Issue Date
1996-01
Citation
전자공학회논문지, v.제 33 권 A 편, pp.126 - 134
URI
https://pubs.kist.re.kr/handle/201004/144651
Appears in Collections:
KIST Article > Others
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