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dc.contributor.author장홍규-
dc.contributor.author김기환-
dc.contributor.author최성창-
dc.contributor.author최두진-
dc.contributor.author최원국-
dc.contributor.author손용배-
dc.contributor.author고석근-
dc.contributor.author정형진-
dc.date.accessioned2024-01-21T20:06:36Z-
dc.date.available2024-01-21T20:06:36Z-
dc.date.created2022-01-10-
dc.date.issued1996-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144738-
dc.titleCu films on Si(100) by partially ionized beam deposition-
dc.title.alternative부분 이온빔 증착법으로 제작한 silicon(100) 기판위의 구리 박막-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJ. ISHM-Korea, The microelectronics society, v.3, no.2, pp.17 - ?-
dc.citation.titleJ. ISHM-Korea, The microelectronics society-
dc.citation.volume3-
dc.citation.number2-
dc.citation.startPage17-
dc.citation.endPage?-
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