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dc.contributor.author염상섭-
dc.contributor.author한영기-
dc.contributor.authorD. J. Choi-
dc.contributor.author왕채현-
dc.date.accessioned2024-01-21T20:11:16Z-
dc.date.available2024-01-21T20:11:16Z-
dc.date.created2022-01-10-
dc.date.issued1996-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144818-
dc.titleDependences of PbTiO//3 thin films on Ti bath temperature and deposition temperature.-
dc.title.alternativeMOCVD 법에 의한 Ti bath 온도와 기판온도 변화에 따른 박막의 증착특성 =-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation요업학회지 = Journal of the Korean ceramic society, v.v. 33, no.no. 4, pp.371 - 378-
dc.citation.title요업학회지 = Journal of the Korean ceramic society-
dc.citation.volumev. 33-
dc.citation.numberno. 4-
dc.citation.startPage371-
dc.citation.endPage378-
dc.subject.keywordAuthorthin films-
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