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dc.contributor.author이환철-
dc.contributor.author김성동-
dc.contributor.author임상호-
dc.contributor.author한석희-
dc.contributor.author김희중-
dc.contributor.author강일구-
dc.date.accessioned2024-01-21T20:33:23Z-
dc.date.available2024-01-21T20:33:23Z-
dc.date.created2022-01-10-
dc.date.issued1995-10-
dc.identifier.issn1017-7701-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144959-
dc.titleEtching characteristics of magnetic thin films by ion beam technique.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation한국자기학회지 = Journal of Korean Magnetics Society, v.v. 5, no.no. 5, pp.538 - 542-
dc.citation.title한국자기학회지 = Journal of Korean Magnetics Society-
dc.citation.volumev. 5-
dc.citation.numberno. 5-
dc.citation.startPage538-
dc.citation.endPage542-
dc.subject.keywordAuthoretching-
dc.subject.keywordAuthormagnetic thin film-
dc.subject.keywordAuthorion beam technique-
dc.subject.keywordAuthoretch rate-
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