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Etching characteristics of magnetic thin films by ion beam technique.

Authors

이환철; 김성동; 임상호; 한석희; 김희중; 강일구

Issue Date

1995-10

Citation

한국자기학회지 = Journal of Korean Magnetics Society, v.v. 5, no.no. 5, pp.538 - 542

Keywords

etching; magnetic thin film; ion beam technique; etch rate

ISSN

1017-7701

URI

https://pubs.kist.re.kr/handle/201004/144959

Appears in Collections:

KIST Article > Others

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