Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김용태 | - |
| dc.contributor.author | 민석기 | - |
| dc.contributor.author | C. S. Kwon | - |
| dc.contributor.author | I. H. Choi | - |
| dc.date.accessioned | 2024-01-21T21:07:12Z | - |
| dc.date.available | 2024-01-21T21:07:12Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1995-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145299 | - |
| dc.title | The characteristics of nitrogen implanted tungsten film as a new diffusion barrier for metal organic chemical vapor deposited Cu metallization. | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | Japanese journal of applied physics, v.v. 34, pp.78 - 81 | - |
| dc.citation.title | Japanese journal of applied physics | - |
| dc.citation.volume | v. 34 | - |
| dc.citation.startPage | 78 | - |
| dc.citation.endPage | 81 | - |
| dc.subject.keywordAuthor | nitrogen implantation | - |
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