A study on the surface modification of graphite by CVD SiC : Growth characteristics of SiC in a horizontal CVD reactor

Other Titles
화학증착 탄화규소에 의한 흑연의 표면개질 연구 : 수평형 화학증착반응관에서 탄화규소 성장특성
Authors
김동주최두진김영욱박상환
Issue Date
1995-01
Citation
요업학회지 = Journal of the Korean Ceramic Society, v.32, no.4, pp.419 - 428
Keywords
Silicon carbide; CVD; Depletion effect; Preferred orientation
URI
https://pubs.kist.re.kr/handle/201004/145323
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE